Check Russia import data of w d under HS code 3818009000. Get import data of Russia for HS code 3818009000
Date | HS Code | Product Description | Trademark | Origin Country | Quantity | Unit | Net Weight [KGS] | Total Value [USD] | Importer Name |
---|---|---|---|---|---|---|---|---|---|
20/Nov/2017 | 3818009000 | Substrate monocrystalline gallium arsenide GAAS (III / V) with successive grown heteroepitaxial layers based on gallium arsenide COMPOUNDS GAAS (III / V), used in production of the laser device. | ABSENT | TAIWAN CHINA | *** | *** | 0.9 | 39600 | View Importer |
22/Nov/2017 | 3818009000 | Chemical elements doped - indium arsenide for use in electronics, in the form of discs DIAMETER 34 mm, 2 mm thick, each disc is packaged in individual packaging, paper-wrapped, folded into individual box, THEN | ABSENT | CHINA | *** | *** | 0.12 | 4500 | View Importer |
08/Nov/2017 | 3818009000 | CHEMICAL COMPOUNDS doped for use in electronics - epitaxial wafers: 2-inch GREEN INGAN, WAVELENGTH 525 + 4 nm, thickness = 100 +/- 10 microns, the luminescence intensity> 280 MCD - 2 PCS. Epitaxial CM. complete | ABSENT | CHINA | *** | *** | 0.16 | 1162,07 | View Importer |
10/Nov/2017 | 3818009000 | Compounds are chemically doped for use in electronics - epitaxial wafers 4-inch red-orange ALGAINP WITH ITO LAYER wavelength 620-630 NM, luminous intensity> 350 MKD, the forward voltage <2,2V CM. AD DITIONAL | ABSENT | TAIWAN CHINA | *** | *** | 0.764 | 5992,24 | View Importer |
07/Nov/2017 | 3818009000 | CHEMICAL COMPOUNDS Alloy: a semiconductor substrate of gallium arsenide, ligated silicon, the conductivity type N, the circular plate 2 inch diameter (50.8 mm), thickness 350 microns, INTENDED FOR USE IN MICROELECTRONICS | WITHOUT A TRADEMARK | *** | *** | *** | 0.272 | 5145 | View Importer |
17/Nov/2017 | 3818009000 | CHEMICAL COMPOUNDS LEGIROVANNYE: SEMICONDUCTOR SUBSTRATE FROM indium phosphide, N-TYPE, doped with sulfur to the circular plate, 3 inch diameter. Used to build electronic equipment, for the subsequent manufacture of diodes and | ABSENT | *** | *** | *** | 0.093 | 1947,75 | View Importer |
15/Nov/2017 | 3818009000 | Monocrystalline wafers silicon carbide polished on both sides, vanadium-doped, semi-insulating, with the same conductivity over the entire surface of the plate to the ISP. As a basis for IZGOTOVLENIYAI heterostructures for microelectronics | SICC | CHINA | *** | *** | 2.36 | 38318,05 | View Importer |
26/Sep/2017 | 3818009000 | The semiconductor wafer (substrate) for the manufacture of heteroepitaxial structures. SHAPED disk diameter (50.0-100.0 +/- 0.3 mm) and 0.35-0.45 +/- 0.015-0.025 THICKNESS MM) doping chemicals. INTENDED TO BASE rogue | *** | JAPAN | 15,4 | *** | 15.4 | 29750 | View Importer |
08/Sep/2017 | 3818009000 | CHEMICAL COMPOUNDS Alloy: SEMICONDUCTOR SUBSTRATE FROM indium phosphide, N-TYPE, doped with sulfur to the circular plate, 3 inch diameter. Used to build electronic equipment, for the subsequent manufacture of diodes and: Transistor | *** | CHINA | 0,17 | *** | 0.17 | 3617,25 | View Importer |
08/Sep/2017 | 3818009000 | CHEMICAL COMPOUNDS Alloy: SEMICONDUCTOR SUBSTRATE FROM indium phosphide, N-TYPE, doped with sulfur to the circular plate, 2 inch diameter. Used to build electronic equipment, for the subsequent manufacture of diodes and: Transistor | *** | CHINA | 0,03 | *** | 0.03 | 1559,25 | View Importer |
11/Sep/2017 | 3818009000 | CHEMICAL COMPOUNDS DOPED: semiconductor epitaxial layer structure of gallium nitride semi-insulating substrate silicon carbide circular plate with a diameter of 3 inches. It used to build electronic equipment, FOR: FOLLOW | *** | JAPAN | 1,8 | *** | 1.8 | 14024,16 | View Importer |
23/Sep/2017 | 3818009000 | OTHER Chemical elements doped (indium arsenide), intended for use in electronics in the form of discs with a diameter 34 mm, 2 mm thick, each disc is packaged in individual packaging, paper-wrapped, folded into individual box,: idea | *** | CHINA | 5 | *** | 5 | 7500 | View Importer |
05/Sep/2017 | 3818009000 | Wafer in the form of discs 100 mm in diameter, thickness of up to 0.7mm MADE gallium arsenide (GAAS), on whose surface Apply epitaxial heterostructures FROM thin layers of gallium arsenide (GAAS) and aluminum arsenide gallium (: AL | *** | TAIWAN CHINA | 0,68 | *** | 0.68 | 31394,35 | View Importer |
20/Sep/2017 | 3818009000 | Molecular Sieve from silicon, optical emission spectrometry ICP OPTIMA 4300 the DV, used in studies of environmental, petrochemical, pharmaceutical areas not contain radioactive sources other than the CROWBAR AND WASTE, NOT CONSUMPTION | *** | GERMANY | 0,02 | *** | 0.02 | 355,97 | View Importer |
04/Sep/2017 | 3818009000 | Substrate monocrystalline gallium arsenide GAAS (III / V) with successive grown heteroepitaxial layers based on gallium arsenide COMPOUNDS GAAS (III / V), used in production of the laser device. Heteroepitaxial substrate on | *** | TAIWAN CHINA | 9 | *** | 9 | 135200 | View Importer |
Our market research report and Russia export statistics of w d covers market share of Russian companies and market price of sunglass. This helps you to do market analysis on the basis of price, company, etc. perfectly and study market size of sunglass in Russia. Few shipment records with a small number of important columns from Russia export data of sunglass are given above. Other hidden fields such as Russian Exporter Name with Address, Foreign er Name with Address, Value, Quantity, Origin & Destination Country and more are also covered in Russia customs data of sunglass. To view more shipment records of sunglass export data of Russia, you can set a filter by Country Name or HS Code on the left side.
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